To address these issues, chip manufacturers have been doing this for many years, and the complexity is constantly increasing.
However, in most cases, this method is essentially cumulative. First, obtain the mask, add some subtle adjustments and functions, and then iterate and repeat. But ILT is more radical. As implied by 'I' (Inverse), ILT utilizes artificial intelligence to solve problems from the opposite direction.
It first draws the path of light in the lithography machine and how it reacts with the photoresist on the wafer. Then, after determining the chip pattern we want to transfer onto the wafer, it will generate optical mask images pixel by pixel, "said Asiamigration.
Overall, these post ILT designs look very peculiar, almost like a psychedelic style, "Asianomy continued. You can also understand their meaning. Obviously, although these chip masks look strange, the final printed product is more likely to truly function, even if there are some defects.
As for how all of this was achieved, it is thanks - yes, you guessed it - to Nvidia's AI analytics technology (called cuLitho) and a new, painstakingly developed technology - creating masks with curves. Previously, masks were entirely composed of squares and rectangles.

Asianometry pointed out that TSMC's upcoming N2 process (also known as the 2-nanometer process) will adopt ILT technology, although it is currently only used for a few mask layers. Usually, a single chip design will use dozens of mask layers. Therefore, when companies such as NVIDIA apply the N2 process to future GPU products, its final effect will be highly noteworthy.
In short, what is implied here is that ILT may have significant implications and can bring about something similar to intergenerational advantages. In other words, it's a bit like upgrading to more advanced chip nodes, allowing for denser packaging of components without the need for shorter wavelength, more problematic light.